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Figure 1
Schematic layout of the beamline optical system. The following abbreviations are used: EPU – elliptically polarizing undulator, M1–M4 – mirrors, BAFF – baffles, PG – plane grating, ES – exit slit, HOS – higher-order suppressing filters, GPES – gas-phase end station, PLES – photoluminescence end station, and SSES – solid-state end station.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 28| Part 5| September 2021| Pages 1620-1630
https://doi.org/10.1107/S1600577521006032
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